Estimation of Plasma Parameters in Vanadium Magnetron Sputtering Using Optical Emission Spectroscopy at Different Experimental Formation Conditions

Optical Emission Spectroscopy (OES) incorporated with the plasma models of glow discharge emission come to be a multipurpose technique of determination plasma parameters. In this work, we have studied the plasma electron temperature Te and electron density ne by OES of low-pressure argon plasma as function to different applied voltages and working pressure in the existence of vanadium target and argon (Ar) gas. The entire electrodes spacing is 5 cm with a flow ratio of 40 sccm. The spectral detection is performed with a spectrometer of wavelength range (200-900nm). The working pressure and applied voltage were 0.085-3.5mbar and 400-600 Voltes respectively. The method had been applied to assess the electron temperature and electron density is a Boltzmann plot method which preferred to amelioration the accuracy of the measurements. Results show for the plasma investigated a rising of the electron temperature when the applied voltage has been increased; while, the electron temperature decreases when the working pressure is increased. In another hand, electron density decreases with the increase in applied voltage and increases with the increase of working pressure. New diagnostic for types of plasmas demonstrates a dependable non-intrusive means of determining the absolute value for electron temperature and density with the least number of assumptions essential compared to other diagnostics approaches.