4.1-Inch Full Color Amoled Driving By Top Gate Nanocrystalline Silicon Thin Film Transistor Array
IDW'10: PROCEEDINGS OF THE 17TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3(2010)
Abstract
High performance nanocrystalline silicon thin film transistors are achieved with top gate staggered structure. The nc-Si is directly deposited by 13.56MHz plasma enhanced chemical vapor deposition (PECVD) at 200 degrees C. Good device performance, uniformity, and reliability make it possible to be integrated into active matrix organic light emitting diode (AMOLED) applications.
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