Molecular Dynamics Simulation of Evaporation of R32 on the Solid Surface

The evaporation of fluid on solid surface is an important process in nature and industry. The high-efficiency heat transport between the working fluid and the solid surface can enhance the energy conversion and utilization. Thus, it is of great significance to study the mechanism of the evaporation phenomenon at the liquid–solid interface. In this study, the evaporation of refrigerant R32 on Pt surface is investigated by molecular dynamics (MD) method. The effects of the substrate temperature on the evaporation behavior of R32 are discussed in detail. It is found that R32 molecules mainly enter the vapor region by evaporation when the substrate temperature is no larger than 300 K. The evaporation rate increases with the increase of substrate temperature. The nucleate boiling and film boiling clearly occur when the substrate temperature is 350 K. The nanobubble formation, growth and coalesce is observed in the simulation. The heat flux changes rapidly when the system is boiling. As time goes on, a vapor film forms and then it leads to the heat transfer deterioration.