Adaptive virtual metrology for semiconductor chemical mechanical planarization process using GMDH-type polynomial neural networks
Journal of Process Control(2018)
摘要
•A GMDH based approach is proposed for adaptive semiconductor virtual metrology (VM).•Two novel types of features are proposed to cope with process dynamics and nonlinearities.•Improved MRR prediction accuracy is reported based on the data from PHM data competition 2016.
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关键词
Chemical mechanical planarization,Virtual metrology,Semiconductor,GMDH,Neural networks
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