聚酰亚胺基底金属薄膜激光刻蚀温度场分布
Chinese Journal of Lasers(2016)
Abstract
为研究脉冲激光刻蚀聚酰亚胺基底镀金属薄膜过程,采用有限元软件COMSOL Multiphysics构建高斯脉冲激光辐照复合材料的2维非稳态物理模型,通过求解热传导方程计算不同功率激光辐照金属薄膜的温度场分布,讨论不同激光参数对刻蚀进程的影响.模拟结果表明:刻蚀深度主要受激光功率密度的影响,且随着金属薄膜厚度的增加,激光刻蚀深度先减小后保持不变.在刻蚀过程中,为了更好地保护基底,应选择大功率短脉宽的激光参数;由于铜薄膜比铝薄膜更难刻蚀,在铜薄膜的刻蚀过程中应选择较大功率密度的激光.结果有助于理解激光刻蚀过程,对实际刻蚀过程有一定的指导意义.
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Key words
Soft Lithography,Semiconductor Lasers,Nanoscale Patterning,Passively Mode-Locked Lasers,Nanolithography
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