New Advances and Steam Laser Cleaning of Opaque and Transparent Critical Substrates: with IR-lasers to New Laser Cleaning Mechanism
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2006）
Abstract
Dry and steam laser cleaning, DLC and SLC, of nano-and micro-contaminant particles from UV/vis opaque and transparent critical Substrates has been studied in front-side laser illumination geometry with the help of time-resolved optical techniques using a nanosecond IR CO2-laser and different energy transfer media (ETM) fluids. In the case of SLC, microscopic details of particle-ETM-substrate interactions in pre-deposited micron-thick ETM layers have been revealed preliminarily by means of time-resolved optical microscopy. Fundamental DLC and SLC mechanisms for removal of nano- and micro-particles from opaque and transparent critical substrates have been determined. Optimal conditions for nearly complete laser cleaning have been chosen for different combinations of contaminating nano- and micro-particles and Substrates.
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Key words
nanosecond CO,laser,isopropyl alcohol,de-ionized water,sub-micron and micron sized particles,opaque and transparent critical Substrates,time-resolved optical microscopy,dry and steam laser cleaning,cleaning mechanisms
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