Lateral Ordering, Position, and Number Control of Self-Organized Quantum Dots: The Key to Future Functional Nanophotonic Devices

IEEE Journal of Selected Topics in Quantum Electronics(2008)

引用 6|浏览5
暂无评分
摘要
Lateral ordering, position, and number control of self-organized epitaxial semiconductor quantum dots (QDs) are demonstrated. Straight linear InAs QD arrays are formed by self-organized anisotropic strain engineering of an InGaAsP/InP (1 0 0) superlattice template in chemical beam epitaxy. The QD emission wavelength at room temperature is tuned into the important 1.55 mu m telecom wavelength region through the insertion of ultrathin GaAs interlayers. Guided self-organized anisotropic strain engineering is demonstrated on shallow- and deep-patterned GaAs (3 1 1)B substrates by molecular beam epitaxy for the formation of complex InGaAs QD arrays. Lateral positioning and number control of InAs QDs, down to a single QD, are demonstrated on truncated InP (1 0 0) pyramids by selective-area metal-organic vapor phase epitaxy. Sharp emission around 1.55 mu m is observed Well above liquid nitrogen temperatures. The regrowth of a passive waveguide structure establishes submicrometer-scale active-passive integration. The demonstrated control over QD formation is the key to future functional nanophotonic devices and paves the way toward the ultimates of photonic-integrated circuits operating at the single and multiple electron and photon level with control of the quantum mechanical and electromagnetic interactions.
更多
查看译文
关键词
III-V semiconductors,gallium arsenide,gallium compounds,indium compounds,molecular beam epitaxial growth,optical materials,self-assembly,semiconductor epitaxial layers,semiconductor growth,semiconductor quantum dots,vapour phase epitaxial growth,GaAs,InGaAsP-InP,InGaAsP-InP (100) superlattice template,chemical beam epitaxy,deep-patterned GaAs (311)B substrate,epitaxial semiconductor quantum dots,functional nanophotonic devices,lateral ordering,liquid nitrogen temperatures,molecular beam epitaxy,passive waveguide structure,room temperature emission wavelength,selective-area metal-organic vapor phase epitaxy,self-organized anisotropic strain engineering,shallow-patterned GaAs (311)B substrate,submicrometer-scale active- passive integration,superlattice template,telecom wavelength region,temperature 293 K to 298 K,truncated InP (100) pyramids,ultrathin interlayers,wavelength 1.55 mum,Patterned substrate,quantum dot (QD),selective-area growth,self-organization,strain engineering
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要