Simulation study of trap-induced noise characteristics in FDSOI MOSFETs

The trap-induced noise characteristics of fully-depleted SOI (FDSOI) MOSFETs with ultra-thin body and buried oxide are essential for high-performance applications. However, accurate noise modeling and traps identification of the device remains challenging. In this work, we investigate the noise characteristics of FDSOI MOSFETs arising from traps in both the gate dielectric (GD) and the buried oxide (BOX). By using TCAD tool, we examine the noise generated by traps at various energy levels and spatial positions in GD and BOX under different biases. The simulation results reveal that traps in GD and BOX exhibit distinctly different behaviors as Vg increases, providing insights for identifying traps from noise measurement results.