O Plasma Alternately Treated ALD-AlO as Gate Dielectric for High Performance AlGaN/GaN MIS-HEMTs.Qiang Wang,Maolin Pan,Penghao Zhang,Luyu Wang,Yannan Yang,Xinling Xie,Hai Huang, Xin Hu,Min XuIEEE Access(2024)引用 0|浏览5暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要