Micron Channel Length ZnO Thin Film Transistors with Different Gate Dielectric Thicknesses Based on Electronic Design Automation Tools

2023 2nd International Conference on Power Systems and Electrical Technology (PSET)(2023)

引用 0|浏览4
暂无评分
摘要
To drive Micro-LEDs, we design ZnO TFTs using Cu/Ti electrodes by TCAD. The proposed ZnO TFTs with 200 and 500 cycles of gate dielectric were fabricated by atomic layer deposition. The improvement in the SS degradation, V TH roll-off and low I ON /I OFF ratio is significant for ZnO TFTs with shorter channel lengths and thinner gate dielectric, which can be attributed to higher current density, electric field and the localization of transmission eigenstates based on first-principle calculations.
更多
查看译文
关键词
gate dielectric thickness,atomic layer deposition,ZnO TFTs,TCAD,first-principle
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要