Low Voltage (10 to 30 keV) CRYO-STEM-EELS: Another Step Toward a Damage-free Mapping of Li in Beam Sensitive Materials

Microscopy and Microanalysis(2023)

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Journal Article Low Voltage (10 to 30 keV) CRYO-STEM-EELS: Another Step Toward a Damage-free Mapping of Li in Beam Sensitive Materials Get access Nicolas Dumaresq, Nicolas Dumaresq McGill University, Montréal, Québec, Canada Corresponding author: Nicolas.dumaresq@mail.mcgill.ca Search for other works by this author on: Oxford Academic Google Scholar Nicolas Brodusch, Nicolas Brodusch McGill University, Montréal, Québec, Canada Search for other works by this author on: Oxford Academic Google Scholar Michel Trudeau, Michel Trudeau Hydro-Québec, Québec, Canada Search for other works by this author on: Oxford Academic Google Scholar Raynald Gauvin Raynald Gauvin McGill University, Montréal, Québec, Canada Search for other works by this author on: Oxford Academic Google Scholar Microscopy and Microanalysis, Volume 29, Issue Supplement_1, 1 August 2023, Pages 1720–1721, https://doi.org/10.1093/micmic/ozad067.889 Published: 22 July 2023
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关键词
li,beam,cryo-stem-eels,damage-free
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