Low-Temperature ALD of SbOx/Sb2Te3 Multilayers with Boosted Thermoelectric Performance

SMALL(2024)

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摘要
Nanoscale superlattice (SL) structures have proven to be effective in enhancing the thermoelectric (TE) properties of thin films. Herein, the main phase of antimony telluride (Sb2Te3) thin film with sub-nanometer layers of antimony oxide (SbOx) is synthesized via atomic layer deposition (ALD) at a low temperature of 80 degrees C. The SL structure is tailored by varying the cycle numbers of Sb2Te3 and SbOx. A remarkable power factor of 520.8 mu W m(-1) K-2 is attained at room temperature when the cycle ratio of SbOx and Sb2Te3 is set at 1:1000 (i.e., SO:ST = 1:1000), corresponding to the highest electrical conductivity of 339.8 S cm(-1). The results indicate that at the largest thickness, corresponding to ten ALD cycles, the SbOx layers act as a potential barrier that filters out the low-energy charge carriers from contributing to the overall electrical conductivity. In addition to enhancing the scattering of the mid-to-long-wavelength at the SbOx/Sb2Te3 interface, the presence of the SbOx sub-layer induces the confinement effect and strain forces in the Sb2Te3 thin film, thereby effectively enhancing the Seebeck coefficient and reducing the thermal conductivity. These findings provide a new perspective on the design of SL-structured TE materials and devices.
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关键词
atomic layer deposition,interface engineering,nanothermoelectricity,SbOx/Sb2Te3,transport property
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