Effect of source to the substrate distance on thermoelectric properties of copper nitride thin films grown by thermal evaporation method

Beriham Basha,Jolly Jacob, Z. Tanveer,A. Ali,N. Amin, K. Javaid,Salma Ikram,K. Mahmood,Aqrab ul Ahmad, M. S. Al-Buriahi, Z. A. Alrowaili,Hongchao Wang,Yuqing Sun

JOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY-JMR&T(2023)

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摘要
This research is carried out to establish a link between thermoelectric properties of Copper Nitride (Cu3N) thin films with its growth parameters. A series of Cu3N thin films is syn-thesized by thermal evaporation technique on glass substrate using different source to substrate distances (21-27 cm) by vacuum tube furnace. X-ray diffraction (XRD), Raman spectroscopy, and Scanning Electron Microscopy (SEM) were used to evaluate different structural, vibrational and morphological properties. A 25 cm source to substrate distance is found to be an optimal value for the highest Seebeck coefficient and electrical conduc-tivity. It is further observed that the Cu3N phase was fully developed at this optimal source to substrate distance. These findings are justifiable because at optimal distance, nitrogen atoms are able to acquire required thermal energy which needed for bonding with Cu atoms.& COPY; 2023 The Author(s). Published by Elsevier B.V. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/).
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关键词
thermoelectric properties,copper nitride,thermal evaporation method,thin films,substrate distance
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