Extremal Molecular Descriptors for Oxide and Silicate Networks

Topological indices are numerical molecular descriptors that reveals structure-property relationship of chemical structures without employing any wet lab. Among numerous kind of indices, neighborhood degree sum ( NDS ) based indices are recently found to be significant in explaining physico-chemical properties of molecules. The present work focuses on determining optimum values of NDS -indices for the class of silicate and oxide networks. Some general formulations of the indices are obtained first for dominating, regular triangulene, and rhombus type silicate and oxide networks, and Copper oxide network. Explicit expressions of some NDS -indices are then generated. Finally, extremal conditions for the indices are established in terms of different network parameters. A graphical comparison of the outcomes is also reported.