Comprehensive study of WSiC:H coatings synthesized by microwave-assisted RF reactive sputtering

WSiC:H coatings were elaborated by reactive magnetron sputtering of a W target in an Ar/Si(CH3)4 plasma assisted by ECR microwave sources. Such coatings can be very interesting for optical or mechanical applications. The development of these coatings is based on the confrontation between in-situ diagnostics of the reactive plasma phase and material characterization of the resulting coatings. The investigation by optical emission spectroscopy of the different phenomena occurring in the reactive plasma reveals that there is a precursor flow rate range where W particles can be favored in the reactive plasma, to promote the development of composite coatings based on a SiC:H matrix, in which W-containing particles or aggregates are present. Material characterization such as Scanning Electron Microscopy, Ion Beam Analysis and X-ray Photoelectron Spectroscopy are used to study the impact of the plasma phase on the microstructure and chemical composition of the deposited materials.