Mixed-Cell-Height Placement With Complex Minimum-Implant-Area Constraints

Mixed-cell-height standard cells are prevailingly used in advanced technologies to achieve better design tradeoffs among timing, power, and routability. As feature size decreases, the placement of cells with multiple threshold voltages may violate the complex minimum-implant-area (MIA) layer rule arising from the limitations of patterning technologies. Existing works consider the mixed-cell-height placement problem only during legalization or handle the MIA constraints during detailed placement. In this article, we address the mixed-cell-height placement problem with MIA constraints in two major stages: 1) post-global placement (Post-GP) and 2) MIA-aware legalization. In the Post-GP stage, we first present a continuous and differentiable cost function to address the Vdd/Vss alignment constraints and add weighted pseudonets to MIA-violation cells dynamically. Then, we propose a proximal optimization method based on the given global placement result to simultaneously consider Vdd/Vss alignment constraints, MIA constraints, cell distribution, cell displacement, and total wirelength. In the MIA-aware legalization stage, we develop a graph-based method to cluster cells of specific threshold voltages and apply a strip-packing-based binary linear programming to reshape cells. Then, we propose a matching-based technique to resolve intrarow MIA violations and reduce filler insertion. Furthermore, we formulate inter-row MIA-aware legalization as a quadratic programming problem, which is efficiently solved by a modulus-based matrix splitting iteration method. Finally, MIA-aware cell allocation and refinement are performed to further improve the result. Experimental results show that without any extra area overhead, our algorithm still can achieve 5.4% shorter final total wirelength than the state-of-the-art work.