Self-forming nanogap diodes operate beyond 10 GHz enabled via adhesion lithography (Conference Presentation)

Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020(2020)

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摘要
Harnessing the omnipresent radio frequency (RF) waves intend to explore the new diode technologies as they determine the frequency of operation and ultimately the power conversion efficiency. Recently, a considerable effort focused on performance, reliable and low-cost fabrication methods. Here, we report the fabrication of sub-20 nm co-planar, asymmetric and self-forming nanogap electrodes by adhesion lithography (a-Lith) as an alternative, low-cost and large-area patterning technique. Moreover, solution processing and rapid Flash Lamp Annealing (FLA) route employed to fabricate Schottky diodes. These diodes are having more than 104 On/Off ratio, low series resistance and junction capacitance due to the novel co-planar architecture and thus operating beyond 10 GHz. This paves the way to a radically new diode technology that has a huge impact on the IoT – Wireless Energy Harvesting (WEH) and RFID system.
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