Effects Of Sputtering Pressure And Thickness On The Properties Of A Molybdenum Bilayer For Solar Cell Applications

The low electrical resistance of molybdenum (Mo) thin films is highly suitable and readily applied as a back electrode of copper indium gallium diselenide (CIGS) based thin film solar cells. In the case of the molybdenum thin film deposited by the sputtering method, the properties of the thin film such as electrical conductivity and adhesion to the substrate are changed according to process conditions such as sputter power and pressure. In this study, Mo thin films were deposited by the DC magnetron sputtering method at different pressures. The electrical, structural and mechanical properties of thin films were analyzed by scanning electron microscope (SEM), X-ray diffraction (XRD), 4-point probe, reflectance, Hall measurement and an adhesion test. Based on these results, Mo double layer thin films with high electrical conductivity were fabricated on the bottom with excellent adhesion to the substrate.