Wake-Up And Fatigue Mechanisms In Ferroelectric Hf0.5zr0.5o2 Films With Symmetric Ruo2 Electrodes

The mechanisms leading to wake-up and fatigue in ferroelectric hafnium zirconium oxide thin film devices with symmetric RuO2 electrodes are investigated via polarization, relative permittivity, dielectric nonlinearity, pyroelectric coefficient, and microfocus x-ray diffraction (XRD) measurements. The devices are observed to wake-up for up to 10(3) bipolar pulsed field cycles, after which fatigue occurs with polarization approaching zero following 10(8) cycles. Wake-up is accompanied by a decrease in both high-field permittivity and hysteresis loop pinching and an increase in the pyroelectric coefficient, indicating that the wake-up process involves a combination of transformations from the tetragonal to the orthorhombic phase and domain depinning from defect redistribution. Fatigue is observed to coincide with an increase in irreversible domain wall motion and a decrease in pyroelectric coefficient. Finite pyroelectric coefficients are measured on fully fatigued devices, indicating that domain pinning is a strong contributor to fatigue and that fatigued devices contain domain structures that are unable to switch under the fields applied for measurement. Microfocus XRD patterns measured on each device reveal that the phase constitution is qualitatively unaffected by field cycling and resultant polarization fatigue. These data indicate that the wake-up process has contributions from both phase transformations and domain depinning, whereas the fatigue process is driven primarily by domain pinning, and the near-zero measured switchable polarization is actually a poled device with immobile domains. These observations provide insight into the physical changes occurring during field cycling of HfO2-based ferroelectrics while examining a possible oxide electrode material for silicon CMOS device implementation.