A 5nm 135mb Sram In Euv And High-Mobility-Channel Finfet Technology With Metal Coupling And Charge-Sharing Write-Assist Circuitry Schemes For High-Density And Low-V-Min Applications

A 135-Mb 0.021- $\mu \text{m}^{2}$ 6-T high-density SRAM bit cell with write-assist circuitries was successfully implemented by using 5-nm HK-metal gate FinFET with EUV and high-mobility channel (HMC) technology. This article proposes the metal capacitor coupling negative bitline (NBL) and the charge-sharing lower cell-VDD (CS-LCV) write-assist techniques to reduce the SRAM minimal supply voltage. Flying bitline (FBL) architecture is also implemented to improve the high-density SRAM macro-bit density by 5%. Silicon data show that both NBL and LCV write-assist techniques can improve the overall SRAM minimal supply voltage performance by more than 300 mV at the 95th percentile.