Study On Cut-Off Characteristics Of Sub-Nanosecond Silicon Carbide Pin Switch

In this paper, a simulation model of p type PiN high voltage pulse open switch is established. The switch operates in "punch through" mode, with a 4 kA/cm(2) cut-off current density and sub-nanosecond cut-off speed. The cut-off process of switch can be divided into three stages, that is, non-equilibrium carriers extraction stage, majority carriers drift stage and charging stage of junction capacitance by change of internal electric field and carrier concentration. Keeping injection current and cut-off current as 20 A and 40 A, the switch cut-off speed and "pedestal" voltage are reciprocally determined. Thus, optimizing the doping concentration and thickness of p layer is a valid solution for the actual system design.