Effects of RF and ELF Radiation on Oxidative Stress of Brain Tissue and Plasma of Diabetic Rats

Objective: Exposure to Radio Frequency (RF) and Extremely Low Frequency (ELF) radiation is increasing steadily with the progress of technology and industrialization. The aim of this study was to investigate whether RF and ELF radiation are oxidative stress effects in the plasma and brain tissue of diabetic and non-diabetic rats. Methods: Experiment groups were designed as follows; C (control), S (sham), ELF (ELF radiation exposure), RF (RF radiation exposure), ELF+RF (ELF and RF radiation exposure), D-C (Diabetic Control), D-S (Diabetic Sham), D-ELF (Diabetic ELF), D-RF (Diabetic RF), D-ELF+RF (Diabetic ELF+RF). The experimental diabetes model was induced with a single dose of 65mg/kg streptozotocin (STZ). 2100 MHz RF and 50 Hz ELF radiation groups exposed for 1 month. Total nitric oxide (NOx), malondialdehyde (MDA) and total sulfhydryl groups (RSH) / glutathione (GSH) levels were measured in plasma and brain tissue. Results: RF + ELF radiation exposure caused an increase in NOx and MDA levels in plasma and brain tissue of diabetic and non-diabetic rats (p<0.05). Exposure to RF and RF + ELF radiation caused a decrease in plasma RSH / tissue GSH levels in non-diabetic rats (p<0.05). Conclusion: The most prominent effect was seen in the diabetic group with RF + ELF radiation exposure.