Enhanced Optimal Multi-Row Detailed Placement for Neighbor Diffusion Effect Mitigation in Sub-10 nm VLSI.

Changho Han,Andrew B. Kahng,Lutong Wang,Bangqi Xu

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems（2019）

引用 17|浏览26

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摘要

Layout-dependent effect causes variation in device performance as well as mismatch in model-hardware correlation in sub-10 nm nodes. In order to effectively explore the power-performance envelope for IC design, cell libraries must provide cells with different diffusion heights, leading to neighbor diffusion effect (NDE) due to inter-cell diffusion height change (diffusion steps). Special filler ce...

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关键词

Very large scale integration,Dynamic programming,Optimization,Integrated circuit synthesis

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