Germanium oxide free atomic layer deposition of silicon oxide and high-k gate dielectric on germanium containing channel for CMOS devices Maryjane Brodsky,Murshed M Chowdhury,Michael P Chudzik,Min Dai,S Krishnan,Shreesh Narasimha,Shahab Siddiquimag(2015)引用 23|浏览18暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要