Broadband source with high power supported by the combined effects of EDFA, Raman scattering and parametric process

Fuyun Lü,Zhaohui Li,Yu Fan,XiaoHann Lim,Jian Chen,Chao Lü

ADVANCED LASER TECHNOLOGIES 2005, PTS 1 AND 2（2006）

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摘要

A broadband source (1520-1620nm) with output power of more than 200mW is achieved using only a single-wavelength, pumping scheme dependent on the combined effects of stimulated Raman scattering, parametric process, and Erbium-doped fiber amplification.

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关键词

erbium,optical amplifiers,raman scattering

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